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Epitaxial wafers (EPI wafers) are essential for high-performance semiconductor devices requiring enhanced electrical properties and precise doping control. At Kanetora, we provide high-quality EPI wafers with uniform thickness, low defect density, and excellent surface finish, supporting advanced applications in power, RF, and logic devices.
EPI Wafer
| Diameter (mm) |
Epi Dopant | Orientation | Structure Design | Epi Resistivity (ohm-cm) |
Epi Thickness (µm) |
Substrate | Notes |
|---|---|---|---|---|---|---|---|
| 150 | Boron (B) / Phosphorus (P) |
100 / 111 | Single or multiple layers |
0.02 ~ 1000 | 1 ~ 150 | Polished, SOI wafer, or others |
Turnkey solution or buried layer Epi service |
| 200 | Boron (B) / Phosphorus (P) |
100 / 111 | Single or multiple layers |
0.02 ~ 1000 | 1 ~ 150 | Polished, SOI wafer, or others |
Turnkey solution or buried layer Epi service |
| 300 | Boron (B) / Phosphorus (P) |
100 / 111 | Single or multiple layers |
0.02 ~ 1000 | 1 ~ 150 | Polished, SOI wafer, or others |
Turnkey solution or buried layer Epi service |
At Kanetora, we proudly support our partners in the semiconductor industry with high-quality wafers, a diverse product portfolio, and flexible customization tailored to every technical need.
We use high-purity silicon with strict quality control to ensure stability for applications ranging from R&D to mass production.
International-grade control of thickness, flatness, and surface roughness optimizes measurement accuracy, equipment calibration, and process control.
Kanetora offers wafers in 2”, 3”, 4”, 5”, 6”, 8”, and 12” sizes with multiple dopant options (P/Boron/N/Ph) and flexible technical configurations.
Thickness, notch/flat type, dopant options, and surface finishes can be fully customized to match each factory’s requirements.
We provide As-Cut, Lapped, Etched, SSP, DSP and more to ensure optimal cleanliness, flatness, and compatibility in both testing and production.
Every wafer is inspected using high-precision measurement systems to ensure batch-to-batch consistency and stable production performance.
21/08/2025
News and Updates
21/08/2025
News and Updates
21/08/2025
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